Download 3D TCAD Simulation for Semiconductor Processes, Devices and by Simon Li PDF

By Simon Li

ISBN-10: 1461404800

ISBN-13: 9781461404804

Technology computer-aided layout, or TCAD, is necessary to today’s semiconductor expertise and anyone operating during this must be aware of anything approximately TCAD. This e-book is set find out how to use software program to fabricate and try nearly semiconductor units in 3D. It brings to existence the subject of semiconductor equipment physics, with a hands-on, educational strategy that de-emphasizes summary physics and equations and emphasizes actual perform and vast illustrations. insurance encompasses a complete library of units, representing the state-of-the-art expertise, equivalent to SuperJunction LDMOS, GaN LED units, etc.

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Additional resources for 3D TCAD Simulation for Semiconductor Processes, Devices and Optoelectronics

Sample text

1 shows a practical design of a device simulator of 3D TCAD capability with various modules. One may regard the drift-diffusion (DD) equation module as central building block of a 3D TCAD device simulator. Optionally, additional modules to perform quantum mechanical calculations and optical modes computation can be built around the main DD module to enhance the application of the simulation program. This is necessary for special applications of 3D TCAD such as nano-scale MOSFET, laser diodes and integrated photonic circuits.

For convenience, we use carrier flux density and current density interchangeably even though they differ by a factor of electron charge. For hydrodynamic model, the expression for the electron (or hole) current is modified: & ' 2! ! 9) where n1j is the electron concentration when the electron quasi-Fermi level coincides with the energy level Etj of the jth trap. A similar definition applies to p1j. 12) reduce to the familiar SRH formula [16] under steady state condition. 16) A trap (or recombination center) is completely specified by its density Ntj, capture cross sections snj and spj, and energy level Etj.

45) L ? 5 Impaction Ionization An important application of 3D TCAD is the design of smart high power devices with high breakdown voltages. Therefore, understanding the influence of impact ionization on the breakdown is necessary. 46) where an is the electron ionization rate defined as the number of electron-hole pairs generated by an electron per unit distance traveled; ap is similarly defined for holes. Both an and ap are strongly dependent on the electric field. 46 is somewhat difficult to implement in a drift-diffusion model because it is not directly concerned with the velocity and considers the mobility coefficient instead.

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